Patterning Polyglycidol Nanogels

Electron beam lithography of poly(glycidol) nanogels for immobilization of a three-enzyme cascade, Jacob N Lockhart, Anthony B. Hmelo and Eva Harth

In this study we have demonstrated for the first time that polyglycidol nanogels are a novel negative tone e-beam resist that can be patterned in order to provide confinement for the study of enzyme chemistry.

Poster ACS 2017 WashDC FINAL[1]-1 — 254nd National Meeting of the American Chemical Society, Washington, D.C., August 2017. “Electron Beam Patterning of Polyglycidol Nanogels For Immobilized Enzyme Cascade Reaction.”

Below, we had some fun producing these micro-scale images of the authors.

Vanderbilt Acorn Image — (A) Vanderbilt University logo patterned by electron beam litho- graphy after spin-coating an aqueous solution of 5 wt% semi-branched poly(glycidol), irradiated at 300 μC cm−2 on silicon, and imaged at 50× magnification by bright field microscopy. (B) AFM modulus image of a portion of the Vanderbilt logo. The black scale bars represent 20 microns. Permission to use logo was granted by the Vanderbilt University Trademark Licensing.