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Professor’s lab brings first ALD systems to Vanderbilt

Posted by on Tuesday, April 2, 2013 in News.

Cary Pint’s lab – Nanomaterials and Energy Devices Laboratory in Olin Hall – is close to completion and it brings to Vanderbilt its first two atomic layer deposition (ALD) systems, relatively small tools that deposit atomically thin layers of material on virtually any surface.

The lab also houses a host of tools for new carbon and non-carbon fabrication, and the ability to test materials for a diverse number of applications.

“With these systems we can engineer structures at nanometer or sub-nanometer resolution to design new materials for energy storage devices,” said Pint, assistant professor of mechanical engineering.

Pint has joined the Vanderbilt engineering faculty from Intel Labs in Santa Clara, Calif., where he was a research scientist in the Extreme Technology Research Group. Pint earned a Ph.D. in applied physics from Rice University and he served as a postdoctoral fellow in the electrical engineering department at the University of California, Berkeley.

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